年产1000吨三氟化氮项⽬（特⽓⾏业纯度99.996%)

三氟化氮（Nitrogen
Trifluoride），化学式NF3，是⼀种强氧化剂。作为⼀种重要的⼯业特种⽓体，具有⼴泛的应⽤领域。
在微电⼦⼯业中，三氟化氮是⼀种优良的等离⼦蚀刻⽓体，在半导体芯⽚、平板显⽰器、光纤、光伏电池等制造领域，三氟化氮主要⽤作等离⼦蚀刻⽓体和反应腔清洗剂。它还可以⽤于⾼能化学激光器，通过与氢反应在瞬间放出⼤量热来实现其应⽤。三氟化氮还可⽤作⾼能燃料，并且在⽕箭发射中作为氧化剂和推进剂使⽤。

Nitrogen trifluoride, chemical formula NF3, is a strong oxidizing agent. As an important industrial special gas, it has a wide range of applications.
In the microelectronics industry, nitrogen trifluoride is an excellent plasma etching gas; In the semiconductor chip, flat panel display, optical fiber, photovoltaic cells and other manufacturing fields, nitrogen trifluoride is mainly used as plasma etching gas and reaction cavity cleaning agent.
It can also be used in high-energy chemical lasers to achieve its application by reacting with hydrogen to emit a large amount of heat in an instant. Nitrogen trifluoride is also used as a high-energy fuel and as an oxidizer and propellant in rocket launches.