年产500吨六氟化钨项目(特气行业纯度99.999%)

500T/Y Tungsten Hexafluoride Project (Special Gas Purity 99.999%)

六氟化钨在常温常压下为无色气体，溶于多数有机溶剂。

六氟化钨主要用作电子工业中金属钨化学气相沉积(CVD)技术，形成金属钨,用于大规模集成电路(LSI)中的配线材料、制造半导体电极、导电浆糊等电子元器件的原材料。

此外，六氟化钨还被广泛用作氟化剂、聚合催化剂及光学材料的原料。在半导体产业主要用于形成金属钨导体膜,这些导体膜在集成电子学中通常被用作高传导性的互连金属、金属层间的通孔和垂直接触的接触孔以及铝和硅间的隔离层。

Tungsten hexafluoride is a colorless gas at room temperature and pressure, soluble in most organic solvents.

Tungsten hexafluoride is mainly used as tungsten metal chemical vapor deposition (CVD) technology in the electronics industry to form tungsten metal, which is used as wiring materials in largescale integrated circuits (LSI), manufacturing semicon-ductor electrodes, conductive pastes and other electronic components.

In additional, tungsten hexafluoride is widely used as a raw material for fluorinating agents, polymerization catalysts and optical materials. Mainly used in the semiconductor industry to form metallic tungsten conductor films, these conductor films are commonly used in integrated electronics as highly conductive interconnect metals, through holes and vertical contact holes between metal layers, and isolation layers between aluminum and silicon.